PVD equipment features：

. Large-span, large-diameter target tube with a guaranteed life cycle of more than 30 days

.  Ultra-strong magnetic bar (target surface >1300 Gs) to obtain high dissociation rate, low impedance and low sputtering voltage
   Configuration of multi-segment atmosphere isolation function, compatible with the development of stacked film systems, indium-free targets       Multi-zone independent atmosphere adjustment for better layer uniformity


.  Carrier plate vapor management system: equipped with multi-stage cold trap and closed carrier plate return system
   Automatic lid opening system to improve the convenience of use and maintenance, and can also be used without traveling                   conditions